Symposium : B-1 : Materials frontier for transparent advanced electronics (3rd Bilateral MRS-J / E-MRS symposium)
Poster Session
  *Award marks are B:Bachelor, M:Master, D:Doctor, G:General
Entry No Presentation Date Award Presenter Affiliation Paper Title
Aug. 29Poster presentations
Clock Tower Hall, 2nd Floor 18:00-20:00 
Chair : Andreas Klein TU Darmstadt  
Chair : Yuzo Shigesato Aoyama Gakuin University 
2437   B1-P29-001 Aug. 29   Kenji YOSHINO Department of Applied Physics and Electronic Engineering, University of Miyazaki Low temperature growth of sprayed high quality Ga-doped ZnO thin films for CuInGaSe2 based solar cell
3537   B1-P29-002 Aug. 29   Haibin WANG Research Center for Advanced Science and Technology, The Univereity of Tokyo Solution Processed Solar Cells Based on PbS Colloidal Quantum Dot / ZnO Nanowire Heterojunctions
2744   B1-P29-003 Aug. 29   Takashi KOIDA National Institute of Advanced Industrial Science and Technology Carrier compensation effects induced by post-annealing treatments under low and high oxygen partial pressure
2803   B1-P29-004 Aug. 29   *B ChangHun KIM School of Materials Science and Engineering, Kyungpook National University The effect of working pressure on the structural and electrical properties in the ZnO:Al,P thin films by the RF-magnetron sputtering
2818   B1-P29-005 Aug. 29   *B Do-Kyum KIM School of Materials Science and Engineering, Kyungpook National University Evaporation-induced phase shift in In-Sn-Zn-O transparent conducting oxide system
2859   B1-P29-006 Aug. 29   *B SangHyub KIM School of Materials Science and Engineering, Kyungpook National University Growth of In-Zn-Si-O Thin Films by RF Magnetron Sputtering
2867   B1-P29-007 Aug. 29   *B Yong-Jae NA School of Materials Science and Engineering, Kyungpook National University Electrical and optical properties of In-Sn-Zn-O thin films grown by RF magnetron sputtering method.
2988   B1-P29-008 Aug. 29   *M Takafumi KUBOTA University of Hyogo Fabrication of graphene and molybdenum oxide hybrid films for transparent conductive films
3048   B1-P29-009 Aug. 29   *M Michitaka FUKUMOTO Department of Chemistry, School of Science, The University of Tokyo Fabrication of Textured Ta:SnO2 Transparent Conductive Films Using Self-Assembled SnO2 Nanoparticles
3235   B1-P29-010 Aug. 29   *B Han-Sol KOO School of Materials Science and Engineering, Kyungpook National University Effect of oxygen pressure on electrical properties of ZnO:(Al, Sb) thin films grown by pulsed laser deposition
3336   B1-P29-011 Aug. 29   *M Takumi SUGANE Graduate school of Science and Engineering, Aoyama Gakuin University Reactive sputter deposition of n-type and p-type SnOx films.
3337   B1-P29-012 Aug. 29   Yuzo SHIGESATO Graduate School of Science and Engineering, Aoyama Gakuin University Study on the Zn-In-O-N (ZION) films deposited by dc or rf sputtering
3338   B1-P29-013 Aug. 29   Yuzo SHIGESATO Graduate School of Science & Engineering, Aoyama Gakuin University Zn3N2 films deposited by dc or rf magnetron sputtering
3483   B1-P29-014 Aug. 29   *M Yuki FUJITA Kindai University Substitutional Effect of Tin on Highly Conductive Barium Iron Vanadate Glass: Structure and Electrical Conductivity
3553   B1-P29-015 Aug. 29   Andreas KLEIN TU Darmstadt Defect Modulation Doping of Transparent Conductive Oxides
3398   B1-P29-016 Aug. 29   *M Shingo YAMAMOTO Graduate School of Science & Engineering, Aoyama Gakuin University Experimental investigation on crystallization of In2O3 based amorphous transparent conductive oxide films
3555   B1-P29-017 Aug. 29   Andreas KLEIN TU Darmstadt Band Alignment Engineering at Cu2O/ZnO Heterointerfaces
2853   B1-P29-018 Aug. 29   *D Minseok KIM University of Yamanashi Band alignment of amorphous Cd-In-O thin films
2251   B1-P29-019 Aug. 29   Toshihiro OKAJIMA Kyushu Synchrotron Light Research Center Phase Stability of Sn doped TiO2 studied by X-ray Absorption Spectroscopy and First-Principles DFT Calculations
3296   B1-P29-020 Aug. 29   *M YUKA KITAZAWA Graduate School of Science and Engineering, Aoyama Gakuin University Photocatalytic TiO2 films deposited on flexible polymer substrates by reactive sputtering
3309   B1-P29-021 Aug. 29   *M Haruka YAMAMOTO Graduate School of Science & Engineering, Aoyama Gakuin University Crystal structure control of TiO2 films deposited by reactive sputtering
3493   B1-P29-022 Aug. 29   *G Junjun JIA Graduate School of Science and Engineering, Aoyama Gakuin Univeristy Tailoring Crystal Structural of Sputtered TiO2 Film by Impurity Doping
3471   B1-P29-023 Aug. 29   *M Hajime MIYAMOTO Kindai University Vanadate Glass applied to Bifunctional Oxygen Electrodes for Metal-Air rechargeable Battery
2628   B1-P29-024 Aug. 29   *B Takanori TAKAHASHI National Institute of Technology, Tsuruoka College Fabrication of Amorphous SrTa2O6 Thin Films Using RF Magnetron Sputtering for Oxide Thin Film Transistor Applications
2749   B1-P29-025 Aug. 29   Kenta SATO Graduate school of Engineering, Tokai Univ. Electrical and Optical properties of VO2 films deposited on conductive Al:ZnO layer
3180   B1-P29-026 Aug. 29   *G Yuichiro YAMASHITA National Institute of Advanced Industrial Science and Technology Expansion of the scope of thermophysical property database for materials informatics
3314   B1-P29-027 Aug. 29   *M Ayaka NAKANO Graduate School of Science and Engineering, Aoyama Gakuin University Characterization of heteroepitaxial grown ITO films deposited by sputtering
3315   B1-P29-028 Aug. 29   *M Risa TATEWAKI Graduate School of Science and Engineering, Aoyama Gakuin University Dielectric constant and work function of tungsten oxide (WO3-x) films
3320   B1-P29-029 Aug. 29   *M Yuji SHITAYANAGI Graduate school of Science & Engineering, Aoyama Gakuin University Gd and Mg-Y switching mirror materials deposited by sputtering
3322   B1-P29-030 Aug. 29   *M Nanako ISHIGURO Graduate School of Science & Engineering, Aoyama Gakuin University Characterization of Si or Ti-doped diamond-like carbon films
3328   B1-P29-031 Aug. 29   *M Ryo ISHIKAWA Graduate School of Science and Engineering Aoyama Gakuin University Structural characterization of GaN films deposited by rf sputtering using He, Ne, Ar, and Kr as sputtering gases
3327   B1-P29-032 Aug. 29   *M Kaho HONDA Graduate School of Science and Engineering, Aoyama Gakuin University Optical, electrical, and thermophysical properties of heteroepitaxial grown Al-doped ZnO (AZO) films
3350   B1-P29-033 Aug. 29   *M Mai SAITO Graduate school of Science and Engineering, Aoyama Gakuin University Deposition of Niobium Oxide films by reactive sputtering with the plasma emission monitoring system
3356   B1-P29-034 Aug. 29   *M Satoshi MINEGISHI Graduate School of Science and Engineering, Aoyama Gakuin University Electrical and thermal conductivity change for epitaxial VO2 film at the metal-insulator phase transition
3405   B1-P29-035 Aug. 29   Nobuto OKA Aoyama Gakuin University,Kindai University Reactive sputter deposition of Nb-doped TiO2 films using Ni-Ti alloy target with impedance control systems
3382   B1-P29-036 Aug. 29   *M Takahiro SUZUKI Graduate School of Science and Engineering, Aoyama Gakuin University Thermal conductivity of Ti-doped diamond-like carbon thin films
4020   B1-P29-037 Aug. 29   Jianhua SHI Shanghai Insitute of Microsystem and Information Technology Chinese Academy of Science,University of Chinese Academy of Sciences >150 cmV-1s-1 Carrier Mobility of Ultrathin Cerium Doped Indium Oxide film Prepared by Ion-plating Technique at Low Temperature